Multiple ExposureBy Roe Ethridge
and Melissa Rubini

photography by Roe Ethridge
fashion by Melissa Rubini


talents: Kelsey Van Mook, Marloes Host, Rasa and Naomi Preizler at Next
fashion assistant Zack Gafin
hair Bok-Hee
make-up Lisa Houghton for YSL
set designer Andy Harman
light design by Christopher Bisagni
digital root Capture
casting Noah Shelley for AM Casting
special thanks to Drive-In Studios